CALICE MAPS Meeting, RAL, 10/11/05 ================================== Present: Jamie Crooks, Paul Dauncey, Anne-Marie Magnan, Renato Turchetta, Giulio Villani, Nigel Watson Minutes: Paul Minutes of previous meeting: No corrections. Sensor simulation: Giulio had circulated a document since the last meeting with some preliminary findings and showed an update during the meeting; both are available from the usual web page. He is now working with pixels and diode spaces half those of previously, i.e. 25mu pixels and 12.5mu diode spacing, giving four diodes per pixel. A total charge of around 1100 e- is seen within the nine pixels around the position the charge is deposited; as the total (for a 20mu epitaxial layer) for a MIP is expected to be 1600 e-, this implies a significant fraction of the charge diffuses outside the simulated 3x3 pixel array. As the diffusion length for this epitaxial thickness is around 120mu, this seems reasonable, although it might indicate a thinner epitaxial layer would be better. Of the observed 100 e-, around 400 e- is seen on the central pixel when summing over the four diodes. With a rough estimate of the noise being 20-40 e-, then (for noise of 40 e-) a five sigma threshold would be around 200 e-, corresponding to ~50% of a MIP. Giulio finds a threshold between 40% and 60% would give reasonable efficiency and not too large a rate of double hits, so this looks feasible. A pixel-to-pixel variation of the threshold will clearly affect the noise and efficiency rates. However, the uniformity across pixels of the process is very hard to predict. The plan is for many pixels to be controlled by a single threshold DAC so choosing this region size will be important. Experimentally, measuring the noise rate as a function of DAC setting once real sensors are produced will be straightforward. Giulio's simulation currently has no n-wells from the circuit itself. Jamie recommended something of the order of 10mu^2 of n-wells should be added; he suggested something like a 3x3mu^2 square in the centre of the pixel for now as there is no more detailed design yet. For comparison, the diodes he simulates 1.5x1.5mu^2 = 2.25mu^2 so four diodes gives 9mu^2 total area. Hence, the circuit n-wells would be the same area as the diodes. The charge collection time is around 200ns, which is longer than the worst-case ILC bunch crossing (i.e. comparator sampling) time. This might either mean there would be charge from one MIP showing up in two consecutive samples or that the sample might have to occur before all the charge is collected. This depends on the reset scheme used to some extent as the charge has to be cleared somehow. The next steps are to repeat the simulation with circuit n-wells and then try a 10mu epitaxial layer with and without these n-wells. Following this, a simulation with one diode per pixel would be useful. Each simulation run takes around 10 days for the computations (mainly due to the huge volume being simulated). Noise rates: Renato showed some slides of noise rate calculations which are available on the usual web page. He has assumed 600 e- signal in a pixel, which is somewhat more than Giulio's values (above) but close enough for this study. He sets a threshold at various factors (3-6) of the noise and sees the expected rate vary very strongly as a function of the cut, as expected. The calculation actually gives the number of times the comparator will give a rising edge per second. Our readout will effectively sample the comparator output per bunch crossing and so the number needed is the probability of the comparator being high at any time. This requires both the rate as calculated by Renato and the time for which the comparator then stays high. He assumed a bandwidth of 1-100MHz, so the "central" frequency of that range is 10MHz, which corresponds to a period of 100ns. Assuming this is the average time the comparator stays on, then Renato's numbers can be converted into probabilities by multiplying by 10^-7 sec. This gives noise rates of order 10^-15 for a six sigma threshold, 10^-10 for five sigma, 10^-6 for four sigma and 10^-3 for three sigma. Some of these are substantially less than obtained by a naive Gaussian integration above the relevant threshold level, which would be 1.0x10^-9 for six sigma, 2.9x10^-7 for five sigma, 3.2x10^-5 for four sigma and 1.4x10^-3 for three sigma and the difference should be understood. Assuming Renato's estimates of the bandwidth are correct, then the low end of 1MHz, i.e. 1us period, is longer than the sampling time of 150ns. This means for noise of this frequency, the comparator is likely to stay high for O(10) samples, giving a correlated set of noise hits in a row. This could swamp the hit memory storage locations and so if this is a realistic likelihood, ways to limit the low end of the frequency range should be considered. Other items; Jamie showed some slides of various issues and suggestions he had been considering; these are available from the usual web page. XFAB have a "standard" (now frozen) XC035 process which Jamie is set up to use. This will remain available for several years. However, there is a higher voltage version, XH035, which we might be interested in using. One application might be to bias the diodes to ~12V while keeping the circuit n-wells ~2V so as to improve the signal charge collection efficiency. The XH035 process is not (yet) certified for stitching. We had previously decided that we would not investigate or use stitching for this project. However, Jamie pointed out that the cost for using it is minimal and that it could be very useful for testing the use of long control lines. The obvious size to aim for would be something close to the 6x6cm^2 diode pad wafers in use in the current CALICE ECAL prototype. Flip-chip bump bonding looks feasible (and not too expensive) with only widely spaced edge pads. The minimum pitch size is 250mu, which sounds feasible, although there is no estimate of the numbers of connections needed yet. The expected data rate has an obvious influence on the time to read all data after a bunch train. Jamie estimates flushing the data from the pixels to a buffer on the edge of the sensor could be done in less than 1ms, which would imply he could continue to use DRAM rather than changing to SRAM. The latter will use more n-wells (and hence absorb more signal charge) and would take more pixel area. Jamie also pointed out that the power required just to drive each clock or data line across the sensor would exceed the power requirement needed to be competitive with the diode pad ASIC. Items from the DESY meeting: Paul reported on various items, see the web page for the slides. The power value quoted in the requirements in (unfortunately) not wrong. To keep the comparators within the requirement (not allowing for any other power sources) then they would need to be turned on for only 10ns in each beam crossing. The suggestion made by Jamie to subdivide trains into several subtrains and allow only one hit in each seems to give much higher overflow rates than the original scheme. However, it looks like only 6 or 8 timestamp memory locations may be needed, rather than the 16 previously assumed. The French groups are pushing for a high-tech 1.5m PCB design with stitching and embedded components. We should probably meet with them in Paris to discuss the power issues and how many of these PCB concepts are realistic. Next meeting: Fri 9 Dec in the R76 microelectronics meeting room, starting at 13.00. People arriving early can meet for lunch beforehand.